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The bandgap tunability of (Si)GeSn group IV semiconductors opens a new era in Si-technology. Depending on the Si/Sn contents, direct and indirect bandgaps in the range of 0.4-0.8 eV can be obtained, offering a broad spectrum of both photonic and low power electronic applications. In this work, we systematically studied capacitance-voltage characteristics of high-k/metal gate stacks formed on GeSn and SiGeSn alloys with Sn-contents ranging from 0 to 14 at.

作者:C, Schulte-Braucks;K, Narimani;S, Glass;N, von den Driesch;J M, Hartmann;Z, Ikonic;V V, Afanas'ev;Q T, Zhao;S, Mantl;D, Buca

来源:ACS applied materials & interfaces 2017 年 9卷 10期

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作者:
C, Schulte-Braucks;K, Narimani;S, Glass;N, von den Driesch;J M, Hartmann;Z, Ikonic;V V, Afanas'ev;Q T, Zhao;S, Mantl;D, Buca
来源:
ACS applied materials & interfaces 2017 年 9卷 10期
标签:
GeSn defects direct band gap generation/recombination high-k/metal gate
The bandgap tunability of (Si)GeSn group IV semiconductors opens a new era in Si-technology. Depending on the Si/Sn contents, direct and indirect bandgaps in the range of 0.4-0.8 eV can be obtained, offering a broad spectrum of both photonic and low power electronic applications. In this work, we systematically studied capacitance-voltage characteristics of high-k/metal gate stacks formed on GeSn and SiGeSn alloys with Sn-contents ranging from 0 to 14 at.